Planar betavoltaic converter creation with plasma-immersion ion implantation process*

Authors :: A V Miakonkih
A E Rogojin
V G Sidorov
S V Bogdanov
P V Zelenkov
Konstantin V. Rudenko
Source :: IOP Conference Series: Materials Science and Engineering. 122:012029
Publication Year :: 2016
Publisher :: IOP Publishing, 2016.
Abstract: Some results on planar diode structure creation by the method of a plasma-immersion ion implantation is presented in this paper. Obtained leakage current ~ 1 uA/cm2 at reverse voltage -1 V.

Subjects :: Betavoltaics
Materials science
business.industry
Analytical chemistry
02 engineering and technology
021001 nanoscience & nanotechnology
Plasma-immersion ion implantation
020501 mining & metallurgy
Planar
Ion implantation
0205 materials engineering
Optoelectronics
0210 nano-technology
business
Planar diode
Voltage

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