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High performance bilayer oxide transistor for gate driver circuitry implemented on power electronic devices

Authors :
Sanghun Jeon
I-hun Song
Seung-Eon Ahn
Ho-Jung Kim
Jai-Kwang Shin
Chang Jung Kim
U-In Chung
Kinam Kim
Inkyung Yoo
Hyun-Sik Choi
Source :
2012 Symposium on VLSI Technology (VLSIT).
Publication Year :
2012
Publisher :
IEEE, 2012.

Abstract

The integration of electronically active oxide transistors onto silicon circuits represents an innovative approach to improving the performance of devices. In this paper, we present high performance oxide transistor for use as gate drive circuitry integrated on top of a power electronic device, providing a novel power system. Specifically, as a core device component in gate driver, oxide transistor exhibits remarkable performance such as, high mobility (23∼47cm2/Vs) and high breakdown voltage (BV) of 60∼340V despite low process temperatures (

Details

Database :
OpenAIRE
Journal :
2012 Symposium on VLSI Technology (VLSIT)
Accession number :
edsair.doi...........347fec76fcbe47f73c30396afe32f313
Full Text :
https://doi.org/10.1109/vlsit.2012.6242493