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Precise Protein Photolithography (P 3 ): High Performance Biopatterning Using Silk Fibroin Light Chain as the Resist
- Source :
- Advanced Science. 4:1700191
- Publication Year :
- 2017
- Publisher :
- Wiley, 2017.
-
Abstract
- Precise patterning of biomaterials has widespread applications, including drug release, degradable implants, tissue engineering, and regenerative medicine. Patterning of protein-based microstructures using UV-photolithography has been demonstrated using protein as the resist material. The Achilles heel of existing protein-based biophotoresists is the inevitable wide molecular weight distribution during the protein extraction/regeneration process, hindering their practical uses in the semiconductor industry where reliability and repeatability are paramount. A wafer-scale high resolution patterning of bio-microstructures using well-defined silk fibroin light chain as the resist material is presented showing unprecedent performances. The lithographic and etching performance of silk fibroin light chain resists are evaluated systematically and the underlying mechanisms are thoroughly discussed. The micropatterned silk structures are tested as cellular substrates for the successful spatial guidance of fetal neural stems cells seeded on the patterned substrates. The enhanced patterning resolution, the improved etch resistance, and the inherent biocompatibility of such protein-based photoresist provide new opportunities in fabricating large scale biocompatible functional microstructures.
- Subjects :
- Materials science
Biocompatibility
General Chemical Engineering
General Physics and Astronomy
Medicine (miscellaneous)
Fibroin
Nanotechnology
02 engineering and technology
Photoresist
010402 general chemistry
01 natural sciences
Biochemistry, Genetics and Molecular Biology (miscellaneous)
law.invention
Tissue engineering
Etching (microfabrication)
law
General Materials Science
fungi
technology, industry, and agriculture
General Engineering
021001 nanoscience & nanotechnology
0104 chemical sciences
SILK
Resist
Photolithography
0210 nano-technology
Subjects
Details
- ISSN :
- 21983844
- Volume :
- 4
- Database :
- OpenAIRE
- Journal :
- Advanced Science
- Accession number :
- edsair.doi...........31ffea36720adc506b62bec37d67a789
- Full Text :
- https://doi.org/10.1002/advs.201700191