Stress Development during the Reactive Formation of Silicide Films

Authors :: François M. d'Heurle
Patrice Gergaud
Olivier Thomas
Christian Rivero
Source :: Defect and Diffusion Forum. :801-812
Publication Year :: 2005
Publisher :: Trans Tech Publications, Ltd., 2005.

Subjects :: Stress (mechanics)
chemistry.chemical_compound
Radiation
Materials science
Strain (chemistry)
chemistry
Reaction formation
Silicide
Relaxation (physics)
General Materials Science
Composite material
Condensed Matter Physics

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