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40 nm Ultralow-Power Charge-Trap Embedded NVM Technology for IoT Applications

Authors :
Z. Luzada
T. Phan
Vijay Raghavan
Igor G. Kouznetsov
Hui Mei Shih
C. Huang
Vineet Agrawal
C.H. Wang
Krishnaswamy Ramkumar
M. Amundson
C.H. Lin
Y. K. Sheu
K.L. Lee
Venkatraman Prabhakar
Kevin Donnelly
C.H. Huang
Long Hinh
P. C. Shih
D. Dalton
Swatilekha Saha
S. Govindaswamy
Source :
2018 IEEE International Memory Workshop (IMW).
Publication Year :
2018
Publisher :
IEEE, 2018.

Abstract

A 40 nm charge-trap embedded NVM technology is presented which is operational at the main power supply of 0.81 to 1.21 V. It is based on SONOS and requires only five extra masking steps beyond standard CMOS. A product-ready 8Mb macro is used to demonstrate technology capabilities. Key features are 25 ns read access time in the 0.99 to 1.21 V supply range and very low current consumption. The macro provides several power- saving modes, 100k write cycles and 10-year data retention for application in consumer and industrial SoCs.

Details

Database :
OpenAIRE
Journal :
2018 IEEE International Memory Workshop (IMW)
Accession number :
edsair.doi...........30f80449368e06c032f7f061c39911e0
Full Text :
https://doi.org/10.1109/imw.2018.8388777