(Invited) Atomically Controlled Processing for Dopant Segregation in CVD Silicon and Germanium Epitaxial Growth

Authors :: Yuji Yamamoto
Junichi Murota
Matty Caymax
Ioan Costina
Roger Loo
Vinh Le Thanh
Bernd Tillack
Source :: ECS Transactions. 79:33-42
Publication Year :: 2017
Publisher :: The Electrochemical Society, 2017.

Subjects :: Materials science
Dopant
Silicon
chemistry
chemistry.chemical_element
Nanotechnology
Germanium
Epitaxy

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