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Polycrystalline Silicon Oxidation Kinetics and Si / SiO2 Interface Width

Authors :
Laura Meda
G. Queirolo
Aldo Armigliato
C. Signorini
G. Ghidini
Source :
Journal of The Electrochemical Society. 133:2381-2385
Publication Year :
1986
Publisher :
The Electrochemical Society, 1986.

Details

ISSN :
19457111 and 00134651
Volume :
133
Database :
OpenAIRE
Journal :
Journal of The Electrochemical Society
Accession number :
edsair.doi...........2ff88caedc7d804bd9d9c232ac4c83b5
Full Text :
https://doi.org/10.1149/1.2108412