Back to Search Start Over

A holistic approach to model-based stochastic-aware computational lithography

Authors :
ChangAn Wang
Yongfa Fan
Mu Feng
Qian Xie
Jazer Wang
Christopher Kaplan
Michael Crouse
Xiaoyang Li
Stephen Hsu
Peigen Cao
Yi-Hsing Peng
Stephen Chang
Jun Ye
Youping Zhang
Bin Cheng
Ken Yang
Leiwu Zheng
Jen-Shiang Wang
Austin Peng
Li-Hao Yeh
Cuiping Zhang
Rafael Howell
Alexander Tan
Yiqiong Zhao
Jun Lang
Xiaolong Zhang
Source :
Optical and EUV Nanolithography XXXVI.
Publication Year :
2023
Publisher :
SPIE, 2023.

Details

Database :
OpenAIRE
Journal :
Optical and EUV Nanolithography XXXVI
Accession number :
edsair.doi...........2fda8ba98471a8bbe07b4274712fec78

Tools

Authors Abstract Subjects Details