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Improved Haacke’s quality factor and paramagnetic-to-ferromagnetic transition realized in Ni co-doped CdO:Zn thin films
- Source :
- Journal of Materials Science: Materials in Electronics. 31:12169-12177
- Publication Year :
- 2020
- Publisher :
- Springer Science and Business Media LLC, 2020.
-
Abstract
- Cadmium oxide (CdO) is a promising transparent conducting oxide semiconductor whose optoelectronic and magnetic properties could be improved through doping. The role of synergetic effect between two metal dopants for enhanced optoelectronic and magnetic properties of CdO is not adequately studied. The mono-doping (Zn) and co-doping (Zn, Ni) effects on the optoelectronic and magnetic properties of CdO have been reported in this paper. Undoped, Zn-doped, and (Zn + Ni) co-doped CdO thin films have been deposited by spray technique using perfume atomizer. Crystallite size of pure CdO decreased from 35 to 29 nm with Zn doping and to 22 nm with (Zn + Ni) co-doping. Lattice parameter value of pure CdO decreased from 4.676 A to 4.669 A with Zn doping and with Ni co-doping it got reduced to 4.664 A. Surface morphology improves with Zn and (Zn + Ni) co-doping. Better optical transparency and widened band gap values were realized for the Zn and (Zn + Ni) co-doped films. Oxygen-related peaks were observed in the PL spectra of all the films. Increased Haacke’s quality factor was observed for the (Zn + Ni) co-doped CdO thin films. Paramagnetic-to-ferromagnetic transition has been realized for the co-doped films. The results obtained infer that the (Zn + Ni) co-doped CdO thin films are well suited for optoelectronic and spintronic device applications.
- Subjects :
- 010302 applied physics
Materials science
Dopant
Band gap
Doping
Analytical chemistry
Condensed Matter Physics
01 natural sciences
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
Paramagnetism
chemistry.chemical_compound
Lattice constant
chemistry
0103 physical sciences
Cadmium oxide
Crystallite
Electrical and Electronic Engineering
Thin film
Subjects
Details
- ISSN :
- 1573482X and 09574522
- Volume :
- 31
- Database :
- OpenAIRE
- Journal :
- Journal of Materials Science: Materials in Electronics
- Accession number :
- edsair.doi...........2f65a7ebaf008c84d37256053085c649
- Full Text :
- https://doi.org/10.1007/s10854-020-03763-3