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Outlier detection in contamination control

Authors :
Jeffrey Weintraub
Scott Warrick
Source :
Metrology, Inspection, and Process Control for Microlithography XXXII.
Publication Year :
2018
Publisher :
SPIE, 2018.

Abstract

A machine-learning model is presented that effectively partitions historical process data into outlier and inlier subpopulations. This is necessary in order to avoid using outlier data to build a model for detecting process instability. Exact control limits are given without recourse to approximations and the error characteristics of the control model are derived. A worked example for contamination control is presented along with the machine learning algorithm used and all the programming statements needed for implementation.

Details

Database :
OpenAIRE
Journal :
Metrology, Inspection, and Process Control for Microlithography XXXII
Accession number :
edsair.doi...........2ca56f4a0187cc9f09a08dcfe3e60f07
Full Text :
https://doi.org/10.1117/12.2297379