Monte carlo simulation of thin-film X-ray microanalysis at high energies

A Monte Carlo code previously used in modelling x-ray emission by incident electrons of several tens of kilo-electronvolts has been extended up to 300 keV, which is typical of the present medium-energy transmission electron microscopes. With the aid of a further numerical code, both the thickness and composition of thin self-supporting films can be simultaneously determined. This code exploits the bootstrap statistical method, which provides a realistic error analysis of the final results from the precision of the experimental data. The potential of the two codes is illustrated through a simulated example of a single self-supporting film. Such calculations can also be applied to two or more overlying films transparent to an electron beam.