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Properties of amorphous semiconducting multilayer films

Authors :
Stanford R. Ovshinsky
H. Fritzsche
James Kakalios
N. Ibaraki
Source :
Journal of Non-Crystalline Solids. 66:339-344
Publication Year :
1984
Publisher :
Elsevier BV, 1984.

Abstract

The structural, optical, and electrical properties of amorphous multilayer films containing up to 180 double layers of a-Si:H/a-SiNx and a-Si:H/a-SiOx were studied. For a-Si:H layer thickness d >100 A the transport properties are dominated by space-charge doping with a-SiNx positive and a-SiOx negatively charged. For d A quantum-well effects increase the optical and electrical gaps. A d =12 A multilayer film shows no evidence for the predicted loss of extended states in two-dimensional disordered systems.

Details

ISSN :
00223093
Volume :
66
Database :
OpenAIRE
Journal :
Journal of Non-Crystalline Solids
Accession number :
edsair.doi...........2b3ee21a7cf7d611a3b0b72cde020edc
Full Text :
https://doi.org/10.1016/0022-3093(84)90341-7