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Highly Manufacturable Shallow Trench Isolation for Giga Bit DRAM

Authors :
H. G Kang
B. H Roh
C. G hong
Y. H Cho
J. W Park
Y. G Shin
K. N kim
S. D Gwun
K. Y Lee
Source :
Extended Abstracts of the 1995 International Conference on Solid State Devices and Materials.
Publication Year :
1995
Publisher :
The Japan Society of Applied Physics, 1995.

Subjects

Subjects :
Bit (horse)
Materials science
business.industry
Shallow trench isolation
Electrical engineering
business
Dram
Giga

Details

Database :
OpenAIRE
Journal :
Extended Abstracts of the 1995 International Conference on Solid State Devices and Materials
Accession number :
edsair.doi...........2a4d08224a91de8231a242d44f1452d4
Full Text :
https://doi.org/10.7567/ssdm.1995.c-4-4
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