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A plasma strategy for high-quality Si/C composite anode: From tailoring the current collector to preparing the active materials
- Source :
- Electrochimica Acta. 347:136222
- Publication Year :
- 2020
- Publisher :
- Elsevier BV, 2020.
-
Abstract
- Herein we propose a novel plasma-based route to synergistically modulate the microstructures of the current collectors of nickel foam and subsequently the Si/C composite active coatings, restraining the huge volume expansion of silicon anode materials during lithiation/delithiation in Lithium ion batteries. The nickel foam surface is tailored to form the temperature-dependent nanostructures by the Ar/H2-plasma. And a 3D Si/C nano-composite structure is constructed in combination of silicon via magnetron sputtering and carbon through the inductively coupled plasma vapor deposition (ICP-CVD). The plasma-activated nickel foam surface leads to the crystallization of the sputtered silicon, and the significantly increased surface area results in the increases of loading rate of Si/C composites (e.g., 75% @room temperature). The electrochemical performance, e.g., the specific capacity, cycle stability and the initial Coulombic efficiency of the composite anode is drastically improved by the plasma processing. The cauliflower-like Si/C composites on the Ar/H2-plasma modified nickel foam at 300 °C exhibits a high capacity of 1941.2 mA h g−1 at 0.1 A g−1 after 100 cycles, and 976 mA h g−1 at 1.6 A g−1 after 500 cycles, increasing by 3–7 times in terms of the current density when compared with the case without the plasma processing.
- Subjects :
- Materials science
Silicon
General Chemical Engineering
chemistry.chemical_element
02 engineering and technology
Chemical vapor deposition
Sputter deposition
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
0104 chemical sciences
Anode
Nickel
Chemical engineering
chemistry
Electrochemistry
Inductively coupled plasma
0210 nano-technology
Current density
Plasma processing
Subjects
Details
- ISSN :
- 00134686
- Volume :
- 347
- Database :
- OpenAIRE
- Journal :
- Electrochimica Acta
- Accession number :
- edsair.doi...........29e84c06e13a65193fba37396bcf0888
- Full Text :
- https://doi.org/10.1016/j.electacta.2020.136222