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Chemical Vapor Deposition Methods for Preparation of Radioactively Doped Thin Films

Authors :
M. Ungerish
R. Platzer
M. Paz
J. A. Gardner
Source :
High Temperature Materials and Processes. 15:159-162
Publication Year :
1996
Publisher :
Walter de Gruyter GmbH, 1996.

Subjects

Subjects :
Materials science
Carbon film
Chemical engineering
Hybrid physical-chemical vapor deposition
Mechanics of Materials
Doping
General Materials Science
Chemical vapor deposition
Physical and Theoretical Chemistry
Combustion chemical vapor deposition
Thin film
Condensed Matter Physics

Details

ISSN :
21910324 and 03346455
Volume :
15
Database :
OpenAIRE
Journal :
High Temperature Materials and Processes
Accession number :
edsair.doi...........2970f75a689f4958ea7fac5f8917ad50
Full Text :
https://doi.org/10.1515/htmp.1996.15.3.159
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