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Lattice dilation acrossn-InP-substrates and its influence on material properties of InP/InGaAsP- double-heterostructures

Authors :
J. Kräusslich
R. Staske
A. Knauer
R. Kittner
Source :
Journal of Electronic Materials. 20:1095-1098
Publication Year :
1991
Publisher :
Springer Science and Business Media LLC, 1991.

Abstract

Precise measurements of lattice parameter and photoluminescence were performed across InP-substrates and InP/InGaAsP-DHS. They show a lattice dilation in a region with enriched free carrier concentration if strongn-type doped InP-substrates of faceted 〈111〉-grown LEC-crystals were used. Strain gradients and mismatch problems have to take into consideration.

Details

ISSN :
1543186X and 03615235
Volume :
20
Database :
OpenAIRE
Journal :
Journal of Electronic Materials
Accession number :
edsair.doi...........28eab347e68bcf610ab1728d08ca5932