Influence of an O2 background gas on the composition and kinetic energies of species in laser induced La0.4Ca0.6MnO3 plasmas

Oxygen is one of the most commonly used background gases for pulsed laser deposition of oxide thin films. In this work the properties of a 308 nm laser-induced La 0.4 Ca 0.6 MnO 3 plasma were analyzed using a quadrupole mass spectrometer combined with an energy analyzer, to investigate the interaction between the various plasma species and the background gas. The composition and kinetic energies of the plasma species were compared in vacuum and an O 2 background gas at different pressures. It has been observed that the O 2 background gas decreases the kinetic energy of the positively charged atomic plasma species. In addition, the interaction with the O 2 background gas causes the generation of positive diatomic oxide species of LaO + , CaO + and MnO + . The amount of negatively charged diatomic or tri-atomic oxide species decreases in the O 2 background compared to vacuum, while the amount of O 2 − increases strongly.