Si—O bond structure in slow‐ion deposited SiO2films

MLA

B. O. Kim, et al. “Si—O Bond Structure in Slow‐ion Deposited SiO2films.” Journal of Applied Physics, vol. 69, Mar. 1991, pp. 3354–56. EBSCOhost, https://doi.org/10.1063/1.348565.

APA

B. O. Kim, Jeung-hyun Jeong, C. Y. Kim, J. W. Chung, & D. H. Baek. (1991). Si—O bond structure in slow‐ion deposited SiO2films. Journal of Applied Physics, 69, 3354–3356. https://doi.org/10.1063/1.348565

Chicago

B. O. Kim, Jeung-hyun Jeong, C. Y. Kim, J. W. Chung, and D. H. Baek. 1991. “Si—O Bond Structure in Slow‐ion Deposited SiO2films.” Journal of Applied Physics 69 (March): 3354–56. doi:10.1063/1.348565.