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Status and Trends of Fixed Abrasive Polishing on Semiconductor
- Source :
- Key Engineering Materials. 499:390-396
- Publication Year :
- 2012
- Publisher :
- Trans Tech Publications, Ltd., 2012.
-
Abstract
- The necessity of fixed abrasive CMP in polishing semiconductor materials processing was analyzed. Compared the shortcomings of traditional free abrasive polishing with the advantages of fixed abrasive polishing, the applications of fixed abrasive polishing technology in semiconductor processing were described. A variety of fixed abrasive polishing pad production methods were introduced. The development trend of fixed abrasive polishing was prospected.
Details
- ISSN :
- 16629795
- Volume :
- 499
- Database :
- OpenAIRE
- Journal :
- Key Engineering Materials
- Accession number :
- edsair.doi...........27720dea8df0bb46f60cdd86468d179e
- Full Text :
- https://doi.org/10.4028/www.scientific.net/kem.499.390