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Status and Trends of Fixed Abrasive Polishing on Semiconductor

Authors :
Yu Fei Zhao
Yu Li Sun
Dun Wen Zuo
Source :
Key Engineering Materials. 499:390-396
Publication Year :
2012
Publisher :
Trans Tech Publications, Ltd., 2012.

Abstract

The necessity of fixed abrasive CMP in polishing semiconductor materials processing was analyzed. Compared the shortcomings of traditional free abrasive polishing with the advantages of fixed abrasive polishing, the applications of fixed abrasive polishing technology in semiconductor processing were described. A variety of fixed abrasive polishing pad production methods were introduced. The development trend of fixed abrasive polishing was prospected.

Details

ISSN :
16629795
Volume :
499
Database :
OpenAIRE
Journal :
Key Engineering Materials
Accession number :
edsair.doi...........27720dea8df0bb46f60cdd86468d179e
Full Text :
https://doi.org/10.4028/www.scientific.net/kem.499.390