Nd dopant effect on structural properties of BiFeO3 thin films and application in a negative capacitance transistor

MLA

Tsung-Kuei Kang, et al. “Nd Dopant Effect on Structural Properties of BiFeO3 Thin Films and Application in a Negative Capacitance Transistor.” Japanese Journal of Applied Physics, vol. 62, Feb. 2023, p. 026502. EBSCOhost, https://doi.org/10.35848/1347-4065/acb6ca.

APA

Tsung-Kuei Kang, Yu-Yu Lin, Han-Wen Liu, Chin-Tai Yang, Po-Jui Chang, Fang-Hsing Wang, Ming-Cheng Kao, & Hone-Zern Chen. (2023). Nd dopant effect on structural properties of BiFeO3 thin films and application in a negative capacitance transistor. Japanese Journal of Applied Physics, 62, 026502. https://doi.org/10.35848/1347-4065/acb6ca

Chicago

Tsung-Kuei Kang, Yu-Yu Lin, Han-Wen Liu, Chin-Tai Yang, Po-Jui Chang, Fang-Hsing Wang, Ming-Cheng Kao, and Hone-Zern Chen. 2023. “Nd Dopant Effect on Structural Properties of BiFeO3 Thin Films and Application in a Negative Capacitance Transistor.” Japanese Journal of Applied Physics 62 (February): 026502. doi:10.35848/1347-4065/acb6ca.