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Effect of Epitaxial-Structure Design and Growth Parameters on the Characteristics of Metamorphic Lasers of the 1.46-μm Optical Range Based on Quantum Dots Grown on GaAs Substrates
- Source :
- Semiconductors. 52:1311-1316
- Publication Year :
- 2018
- Publisher :
- Pleiades Publishing Ltd, 2018.
-
Abstract
- The characteristics of lasers of the 1.44–1.46-μm optical range grown on GaAs substrates using a metamorphic buffer are studied. The active region of the laser contains 10 rows of InAs/In0.4Ga0.6As/In0.2Ga0.8As quantum dots. It is shown that the use of special selective high-temperature annealing along with the application of short-period In0.2Ga0.8As/In0.2Al0.3Ga0.5As short-period superlattices makes it possible to substantially decrease the density of threading dislocations in the active region. A threshold current density of 1300 A cm–2, external differential quantum efficiency of 38%, and maximal pulsed-mode output power of 13 W are attained for a laser with a broad area 3 mm in length.
- Subjects :
- 010302 applied physics
Materials science
business.industry
Annealing (metallurgy)
Superlattice
Metamorphic rock
02 engineering and technology
021001 nanoscience & nanotechnology
Condensed Matter Physics
Epitaxy
Laser
01 natural sciences
Atomic and Molecular Physics, and Optics
Buffer (optical fiber)
Electronic, Optical and Magnetic Materials
law.invention
Quantum dot
law
0103 physical sciences
Optoelectronics
0210 nano-technology
business
Current density
Subjects
Details
- ISSN :
- 10906479 and 10637826
- Volume :
- 52
- Database :
- OpenAIRE
- Journal :
- Semiconductors
- Accession number :
- edsair.doi...........264333bd512b6666a999160fa2634a35