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Preparation of aluminium doped Ta3N5 films via nitridation of sputtered tantalum oxide films

Authors :
Sam Macartney
Richard Wuhrer
Laurel George
Leigh R. Sheppard
Source :
Materials Chemistry and Physics. 287:126110
Publication Year :
2022
Publisher :
Elsevier BV, 2022.

Details

ISSN :
02540584
Volume :
287
Database :
OpenAIRE
Journal :
Materials Chemistry and Physics
Accession number :
edsair.doi...........25dd0ed98e6b0253b8dcdf537ec5c10b
Full Text :
https://doi.org/10.1016/j.matchemphys.2022.126110