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The Research of Temperature characteristics of SiGe HBT and the Reliability under Thermal Stress

Authors :
Xu Chen
Chen Jianxin
Yang Wu-tao
Yang Wei-ming
Source :
2009 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits.
Publication Year :
2009
Publisher :
IEEE, 2009.

Abstract

The temperature characteristics of SiGe HBT and its reliability under thermal stress are studied. The experiment results indicate that the current gain at 77K is much larger than the one at 290K. And there is a critical value of I C , which is 2×10−4A. Over this value, the gain increases with the decrease of the temperature. But below the value, the gain drops with the decrease of the temperature. The current ideal factor is smaller than 2 when the temperature is over 193K, but larger than 2 at 193K or below. Besides this, the thermal stress experiments for the base-emitter junction were taken under 100°C and 150°C, and the stress time was 90 hours and 30 hours, respectively. The experiment results indicate that the device characteristic parameters fluctuate under the different thermal stress conditions. The annealing and degeneration play the collective role in the characteristics fluctuating under the thermal stress condition.

Details

Database :
OpenAIRE
Journal :
2009 16th IEEE International Symposium on the Physical and Failure Analysis of Integrated Circuits
Accession number :
edsair.doi...........2545c503144d7e4c3ff5022f5ae1b87b
Full Text :
https://doi.org/10.1109/ipfa.2009.5232641