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Crystal growth of the intermetallic compound Nd2PdSi3

Authors :
Christian G. F. Blum
Laijun Liu
Yadong Xu
Wolfgang Löser
Fei Tang
Bernd Büchner
Source :
Crystal Research and Technology. 46:135-139
Publication Year :
2011
Publisher :
Wiley, 2011.

Abstract

Nd2PdSi3 single crystals were grown by a vertical floating zone method with radiation heating at a zone traveling rate of 3 mm/h. The compound exhibits congruent melting behavior at a liquidus temperature of about 1790 °C. The actual crystal composition (35.3 ± 0.5) at.% Nd, (16.2 ± 0.5) at.% Pd, and (48.5 ± 0.5) at.% Si is slightly depleted in Pd and Si with respect to the nominal stoichiometry. Therefore, the gradual accumulation of these elements in the traveling zone led to a decrease of the operating temperature during the growth process. Single crystalline samples exhibit a large anisotropy due to the crystal electric field effect and order ferromagnetically below the Curie temperature TC = 15.1 K. The [001] orientation was identified as the magnetic easy axis at low temperatures. (© 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

Details

ISSN :
02321300
Volume :
46
Database :
OpenAIRE
Journal :
Crystal Research and Technology
Accession number :
edsair.doi...........250b47aac19f2a0094a54783b291e6da
Full Text :
https://doi.org/10.1002/crat.201000653