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Thermal Atomic Layer Etching of Nickel Using Sequential Chlorination and Ligand-Addition Reactions
- Source :
- Chemistry of Materials. 33:9174-9183
- Publication Year :
- 2021
- Publisher :
- American Chemical Society (ACS), 2021.
-
Abstract
- The thermal atomic layer etching (ALE) of nickel was demonstrated using sequential chlorination and ligand-addition reactions. Nickel chlorination was achieved using SO2Cl2 (sulfuryl chloride) as t...
- Subjects :
- inorganic chemicals
Addition reaction
Materials science
Ligand
General Chemical Engineering
Inorganic chemistry
chemistry.chemical_element
General Chemistry
Sulfuryl chloride
Nickel
chemistry.chemical_compound
chemistry
Etching (microfabrication)
Thermal
otorhinolaryngologic diseases
polycyclic compounds
Materials Chemistry
Layer (electronics)
Subjects
Details
- ISSN :
- 15205002 and 08974756
- Volume :
- 33
- Database :
- OpenAIRE
- Journal :
- Chemistry of Materials
- Accession number :
- edsair.doi...........24b1988ba7befe04ea8bf52a4fc44954
- Full Text :
- https://doi.org/10.1021/acs.chemmater.1c02684