Back to Search
Start Over
Lead Sulfide-Silicon MOSFET Infrared Focal Plane Development
- Source :
- Focal Plane Methodologies III.
- Publication Year :
- 1983
- Publisher :
- SPIE, 1983.
-
Abstract
- A process for directly integrating photoconductive lead sulfide (PbS) infrared detector material with silicon MOS integrated circuits has been developed primarily for application in long (greater than 10,000 detector elements) linear arrays for pushbroom scanning applications. The processing technology is based on the conventional PMOS and CMOS technologies with a variation in the metallization. Results and measurements on a fully integrated eight-element multiplexer are shown.
- Subjects :
- Materials science
business.industry
Detector
Hardware_PERFORMANCEANDRELIABILITY
Integrated circuit
PMOS logic
law.invention
chemistry.chemical_compound
CMOS
chemistry
law
MOSFET
Hardware_INTEGRATEDCIRCUITS
Optoelectronics
Field-effect transistor
Lead sulfide
Infrared detector
business
Hardware_LOGICDESIGN
Subjects
Details
- ISSN :
- 0277786X
- Database :
- OpenAIRE
- Journal :
- Focal Plane Methodologies III
- Accession number :
- edsair.doi...........23e207d81f026fc0f16455ee2a024ecd