XUV Reflection and Ellipsometry Experiments at ELIBeamlines

Authors :: Jaroslav Nejdl
Matej Jurkovič
Shirly Espinoza
M. Albrecht
Jakob Andreasson
Ondřej Hort
Luca Poletto
Mateusz Rebarz
Roman Antipenkov
Fabio Samparisi
Ondřej Finke
Martin Zahradnik
Source :: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS).
Publication Year :: 2020
Publisher :: Optica Publishing Group, 2020.
Abstract: We report on the results of the recent experiments of the XUV ELIps reflection and ellipsometry station at ELI Beamlines. Using the High Harmonic Generation source and a 1 kHz in-house developed laser, experiments in known samples such as GaN, STO and SiC were done and will be discussed.

Subjects :: Materials science
business.industry
Gallium nitride
Laser
law.invention
chemistry.chemical_compound
Optics
chemistry
law
Ellipsometry
Extreme ultraviolet
Reflection (physics)
Silicon carbide
High harmonic generation
business

Database :: OpenAIRE
Journal :: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS)
Accession number :: edsair.doi...........213d095105925381736495fcf1a01d67
Full Text :: https://doi.org/10.1364/euvxray.2020.jw1a.23