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Breakdown walkout in AlAs/GaAs HEMTs
- Source :
- IEEE Transactions on Electron Devices. 39:738-740
- Publication Year :
- 1992
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 1992.
-
Abstract
- It was observed that the gate breakdown voltage of an unpassivated AlGaAs/GaAs HEMT can move to higher negative values when a current is allowed to flow through the gate under reverse gate bias voltage. When a reverse bias is applied between the gate and source, this breakdown 'walkout' can be accompanied by a permanent increase in device source resistance and decreases in transconductance and drain saturation current. A similar effect was observed in AlGaAs/InGaAs/GaAs pseudomorphic HEMTs and in GaAs MESFETs. This effect was not observed in silicon nitrided passivated devices. >
- Subjects :
- Materials science
business.industry
Transconductance
Electrical engineering
Time-dependent gate oxide breakdown
Biasing
High-electron-mobility transistor
Electronic, Optical and Magnetic Materials
Gallium arsenide
chemistry.chemical_compound
chemistry
Saturation current
Optoelectronics
Breakdown voltage
Field-effect transistor
Electrical and Electronic Engineering
business
Subjects
Details
- ISSN :
- 00189383
- Volume :
- 39
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Electron Devices
- Accession number :
- edsair.doi...........2115df3b61cdc8b28f557bc02e62e673
- Full Text :
- https://doi.org/10.1109/16.123504