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Dot Line Pattern Formation in Photoresist Films by Mask-Guided LIPSS Formation Due to Excimer Laser Irradiation

Authors :
Klaus Zimmer
Jian Lu
Martin Ehrhardt
Pierre Lorenz
Bing Han
Source :
Journal of Laser Micro/Nanoengineering.
Publication Year :
2019
Publisher :
Japan Laser Processing Society, 2019.

Subjects

Subjects :
Electrical and Electronic Engineering
Instrumentation
Industrial and Manufacturing Engineering

Details

ISSN :
18800688
Database :
OpenAIRE
Journal :
Journal of Laser Micro/Nanoengineering
Accession number :
edsair.doi...........20f4da0f9f7860f9c63ae11ebf930244

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