BiFeO3 thin films prepared on metallic Ni tapes by chemical solution deposition: effects of annealing temperature and a La0.5Sr0.5TiO3 buffer layer on the dielectric, ferroelectric and leakage properties

In this work, BiFeO3 (BFO) thin films were prepared on metallic Ni (200) tapes with and without a La0.5Sr0.5TiO3 (LSTO) buffer layer at different temperatures by chemical solution deposition. The effects of the annealing temperature as well as the LSTO buffer layer on the dielectric, leakage and ferroelectric properties have been studied in detail. The crystallite size, dielectric constant and leakage current density increase, while the coercive field decreases with increasing annealing temperature. The BFO thin films deposited directly on the Ni tapes are prone to wrinkling, while the wrinkles are smoothed by introducing a thin LSTO buffer layer. Decreased compressive microstrain as well as improved ferroelectric and leakage properties are observed in the BFO thin films deposited on the LSTO buffered Ni tapes. The results will provide an instructive route to optimize BiFeO3-based thin films on metallic tapes by chemical solution deposition methods.