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Effect of Post-Deposition Annealing on the Structural, Optical and Electrical Properties of Ti-doped Indium Oxide Thin Films
- Source :
- Korean Journal of Metals and Materials. 54:775-779
- Publication Year :
- 2016
- Publisher :
- The Korean Institute of Metals and Materials, 2016.
- Subjects :
- Materials science
business.industry
Annealing (metallurgy)
Doping
Metals and Alloys
Oxide
chemistry.chemical_element
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
chemistry.chemical_compound
Optics
chemistry
Sputtering
Modeling and Simulation
X-ray crystallography
Figure of merit
Optoelectronics
Thin film
business
Indium
Subjects
Details
- ISSN :
- 22888241 and 17388228
- Volume :
- 54
- Database :
- OpenAIRE
- Journal :
- Korean Journal of Metals and Materials
- Accession number :
- edsair.doi...........209f1df541e167b285c413a69eab75f0