Back to Search
Start Over
A Near Edge X-ray Absorption Fine Structure Spectroscopy Investigation of the Structure of Self-Assembled Films of Octadecyltrichlorosilane
- Source :
- Langmuir. 18:1250-1256
- Publication Year :
- 2002
- Publisher :
- American Chemical Society (ACS), 2002.
-
Abstract
- Polarization-dependent near edge X-ray absorption fine structure (NEXAFS) spectroscopy was used to determine the ordering of octadecyltrichlorosilane (OTS) molecules in self-assembled (SA) films on Si/SiOx. Coverages of adsorbed material for different SA films were determined by integration of the NEXAFS signal due entirely to the C 1s absorption. The structures and coverages of the SA films deposited by chemisorption from solution in toluene were determined for two different deposition conditions: (1) open to the atmosphere and (2) water- and oxygen-free conditions inside a drybox. SA films of OTS deposited under ambient air conditions grew as islands on the substrate and were well-ordered as indicated by a strong polarization-dependence in the NEXAFS spectra. For depositions performed in the drybox, ordered or disordered films grew uniformly over the substrate. Ordered SA films deposited in the drybox exhibited higher average tilt angles and lower coverages of adsorbed material than SA films deposited u...
- Subjects :
- Materials science
Analytical chemistry
Surfaces and Interfaces
Substrate (electronics)
Condensed Matter Physics
Octadecyltrichlorosilane
XANES
X-ray absorption fine structure
chemistry.chemical_compound
Crystallography
chemistry
Chemisorption
Electrochemistry
General Materials Science
Absorption (chemistry)
Spectroscopy
Deposition (law)
Subjects
Details
- ISSN :
- 15205827 and 07437463
- Volume :
- 18
- Database :
- OpenAIRE
- Journal :
- Langmuir
- Accession number :
- edsair.doi...........20789278a9f84ee37b5ed29e1983bbac