Plasma Enhanced Chemical Vapor Deposition of Conformal GeTe Layer for Phase Change Memory Applications

MLA

Sandrine Lhostis, et al. “Plasma Enhanced Chemical Vapor Deposition of Conformal GeTe Layer for Phase Change Memory Applications.” ECS Journal of Solid State Science and Technology, vol. 1, Jan. 2012, pp. Q119–22. EBSCOhost, https://doi.org/10.1149/2.017206jss.

APA

Sandrine Lhostis, Raluca Tiron, P. Michallon, Sylvain Maitrejean, Romuald Blanc, Christophe Vallée, E. Gourvest, & Dominique Jourde. (2012). Plasma Enhanced Chemical Vapor Deposition of Conformal GeTe Layer for Phase Change Memory Applications. ECS Journal of Solid State Science and Technology, 1, Q119–Q122. https://doi.org/10.1149/2.017206jss

Chicago

Sandrine Lhostis, Raluca Tiron, P. Michallon, Sylvain Maitrejean, Romuald Blanc, Christophe Vallée, E. Gourvest, and Dominique Jourde. 2012. “Plasma Enhanced Chemical Vapor Deposition of Conformal GeTe Layer for Phase Change Memory Applications.” ECS Journal of Solid State Science and Technology 1 (January): Q119–22. doi:10.1149/2.017206jss.