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Electrical Approach of Homogenous High Pressure Ne/Xe/HCl Dielectric Barrier Discharge for XeCl (308 nm) Lamp

Authors :
Z. Harrache
Ahmed Belasri
Source :
Plasma Chemistry and Plasma Processing. 31:787-798
Publication Year :
2011
Publisher :
Springer Science and Business Media LLC, 2011.

Abstract

This paper reports the investigation of the excimer UV emission efficiency in Ne/Xe/HCl mixture in terms of the homogenous model of a dielectric barrier discharge. The computer model developed is based on the Ne/Xe/HCl gas mixture chemistry, the circuit and the Boltzmann equations. The effects of operating voltage, HCl concentration in the mixture as well as gas pressure on the discharge efficiency and the 172, and 308 nm photon generation, under typical experimental operating conditions, have been investigated and discussed. Calculations suggest that the overall conversion efficiency from electrical energy to VUV emission in the lamp is greater than 27%, and it will be very affected at high voltage amplitude and high gas pressure with a significant dependence on the HCl concentration in the gas mixture.

Details

ISSN :
15728986 and 02724324
Volume :
31
Database :
OpenAIRE
Journal :
Plasma Chemistry and Plasma Processing
Accession number :
edsair.doi...........1ea5ba6f928303c870c478be2145d2b2
Full Text :
https://doi.org/10.1007/s11090-011-9305-4