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ChemInform Abstract: Low Pressure Chemical Vapor Deposition of Si1-xGex Films Using Si2H6 and GeH4 Source Gases

Authors :
M.‐K. Ryu
Sungshil Kim
Juyeon Kim
Ki-Bum Kim
Source :
ChemInform. 27
Publication Year :
2010
Publisher :
Wiley, 2010.

Subjects

Subjects :
Chemical engineering
Chemistry
Nanotechnology
General Medicine
Chemical vapor deposition

Details

ISSN :
09317597
Volume :
27
Database :
OpenAIRE
Journal :
ChemInform
Accession number :
edsair.doi...........1e750fb5c20a86e1c7b9b8025cf718ad

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