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Ab Initio Simulation of Position-Dependent Electron Energy Loss and Its Application to the Plasmon Excitation of Nanographene

Authors :
Zhufeng Hou
Zejun Ding
Xun Liu
Bo Da
Dabao Lu
Source :
The Journal of Physical Chemistry C. 123:25341-25348
Publication Year :
2019
Publisher :
American Chemical Society (ACS), 2019.

Abstract

We present a newly developed ab initio simulation method of the position-dependent electron energy loss and employ it to study the plasmon excitation of the zigzag-edged nanographene. This method e...

Details

ISSN :
19327455 and 19327447
Volume :
123
Database :
OpenAIRE
Journal :
The Journal of Physical Chemistry C
Accession number :
edsair.doi...........1c25c2c6e280cc21be9bdd6d538f31e3
Full Text :
https://doi.org/10.1021/acs.jpcc.9b06602