Back to Search
Start Over
Chemical functionalization of atomically flat cantilever surfaces
- Source :
- Microelectronic Engineering. 86:1200-1203
- Publication Year :
- 2009
- Publisher :
- Elsevier BV, 2009.
-
Abstract
- In this paper, we present a novel approach toward the fabrication of mechanical oscillators with a local chemical functionalization with subnanometric control. Our method exploits the reactivity of the freshly cleaved surfaces that form when a monocrystalline silicon microstructure is cleaved. The surfaces that form after the cleave expose an atomically smooth Si(111) surface which, if a suitable chemical environment is provided, could undergo to a cycloaddition process that create stable, local and specific chemical bonds. Here, we demonstrated the feasibility of such a scheme on a twin cantilevers geometry, we prove the effective selectivity and stability of the cycloaddition process and we provide experimental evidence that below a critical size, the cleavage procedure creates step free atomically flat silicon surfaces.
- Subjects :
- Materials science
Cantilever
Fabrication
Silicon
chemistry.chemical_element
Nanotechnology
Cleavage (crystal)
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Monocrystalline silicon
Chemical bond
chemistry
Cleave
Reactivity (chemistry)
Electrical and Electronic Engineering
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 86
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........1bc0aaac5f863ee4a6caac870c34ca57