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Dense Plasma Focus Source

Dense Plasma Focus Source

Authors :
Richard M. Ness
Jerzy R. Hoffman
Oleg Khodykin
Curtis L. Rettig
William N. Partlo
Stephan T. Melnychuk
Igor V. Fomenkov
Ian Roger Oliver
Norbert R. Bowering
Publication Year :
2010
Publisher :
SPIE, 2010.

Abstract

With the emergence of EUVL as the chosen technology for next-generation lithography (NGL) systems, significant effort has been spent in developing light sources consistent with the challenging requirements of the scanner manufacturers as well as meeting the aggressive demands of the end users for high-volume manufacturing (HVM). A light source with extremely high power and brightness is required for integration into a scanner tool based on reflective optics with multilayer (ML) coatings, since it needs to be designed for highest throughput at a wavelength of 13.5 nm. Over the past six years at Cymer Inc., we have pursued the research and development of DPPs to meet the demands for commercial HVM tools. A dense plasma focus (DPF) configuration was chosen because it provides an open geometry with large possible collection angle and can be operated over a wide parameter range. The main thrust of our research and development is devoted to achieving the challenging industry demands on light-source performance, requiring extremely high output power (

Details

Database :
OpenAIRE
Accession number :
edsair.doi...........1b92ffeec333c32adcd805185ad48db2
Full Text :
https://doi.org/10.1117/3.613774.ch12