ArF excimer laser lithography using monochromatic projection lens coupled with narrowed-bandwidth laser

We have developed an ArF excimer laser exposure system that combines a monochromatic quartz projection lens system and a spectrally-narrowed ArF excimer laser. The bandwidth of the laser was narrowed to 0.7 pm by using three prisms and an etalon. We fabricated 0.12 micrometers lines-and-spaces using an alternating phase shifting mask and a top surface imaging resist.