Microstructure and electrical characteristics of Ba0.65Sr0.35TiO3 thin films etched in CF4/Ar/O2 plasma

MLA

Wei Liu, et al. “Microstructure and Electrical Characteristics of Ba0.65Sr0.35TiO3 Thin Films Etched in CF4/Ar/O2 Plasma.” Microelectronic Engineering, vol. 85, Nov. 2008, pp. 2269–75. EBSCOhost, https://doi.org/10.1016/j.mee.2008.07.005.

APA

Wei Liu, Xingzhong Zhao, Bobby Sebo, Guojia Fang, Hao Hu, Huiming Huang, Sheng Xu, Meiya Li, & Zuci Quan. (2008). Microstructure and electrical characteristics of Ba0.65Sr0.35TiO3 thin films etched in CF4/Ar/O2 plasma. Microelectronic Engineering, 85, 2269–2275. https://doi.org/10.1016/j.mee.2008.07.005

Chicago

Wei Liu, Xingzhong Zhao, Bobby Sebo, Guojia Fang, Hao Hu, Huiming Huang, Sheng Xu, Meiya Li, and Zuci Quan. 2008. “Microstructure and Electrical Characteristics of Ba0.65Sr0.35TiO3 Thin Films Etched in CF4/Ar/O2 Plasma.” Microelectronic Engineering 85 (November): 2269–75. doi:10.1016/j.mee.2008.07.005.