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Investigation of SACVD-Based STI Process on Electrical Characteristics of Nanoscale NMOSFETs

Authors :
C. W. Kuo
Sung-Yen Chang
Cheng Tung Huang
D. G. Hong
Y. T. Huang
Hong Lin
San-Lein Wu
O. Cheng
Chung-Yu Wu
Source :
Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials.
Publication Year :
2010
Publisher :
The Japan Society of Applied Physics, 2010.

Details

Database :
OpenAIRE
Journal :
Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials
Accession number :
edsair.doi...........19ff046cd49b753615673880ceaf673e
Full Text :
https://doi.org/10.7567/ssdm.2010.p-3-21