Relaxation of thermally induced defects in LPCVD amorphous silicon

MLA

Stanislaw M. Pietruszko, et al. “Relaxation of Thermally Induced Defects in LPCVD Amorphous Silicon.” Journal of Non-Crystalline Solids, May 1998, pp. 328–31. EBSCOhost, https://doi.org/10.1016/s0022-3093(98)00174-4.

APA

Stanislaw M. Pietruszko, S. C. Agarwal, M. Kostana, & Pratima Agarwal. (1998). Relaxation of thermally induced defects in LPCVD amorphous silicon. Journal of Non-Crystalline Solids, 328–331. https://doi.org/10.1016/s0022-3093(98)00174-4

Chicago

Stanislaw M. Pietruszko, S. C. Agarwal, M. Kostana, and Pratima Agarwal. 1998. “Relaxation of Thermally Induced Defects in LPCVD Amorphous Silicon.” Journal of Non-Crystalline Solids, May, 328–31. doi:10.1016/s0022-3093(98)00174-4.