In situ analysis of growth rate evolution during molecular layer deposition of ultra-thin polyurea films using aliphatic and aromatic precursors

Authors :: Rachel A. Nye
Siyao Wang
Stefan Uhlenbrock
John A. Smythe
Gregory N. Parsons
Source :: Dalton Transactions. 51:1838-1849
Publication Year :: 2022
Publisher :: Royal Society of Chemistry (RSC), 2022.
Abstract: MLD growth evolution depends on the deposition surface and monomer structure of the deposited film.

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