High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system

MLA

Lin Wang, et al. “High Resolution X-Ray Mask Fabrication by a 100 KeV Electron-Beam Lithography System.” Journal of Micromechanics and Microengineering, vol. 14, Mar. 2004, pp. 722–26. EBSCOhost, https://doi.org/10.1088/0960-1317/14/5/010.

APA

Lin Wang, Yohannes M. Desta, Joachim Schulz, Herbert Hein, Peter Jakobs, Rainer K. Fettig, & Jost Goettert. (2004). High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system. Journal of Micromechanics and Microengineering, 14, 722–726. https://doi.org/10.1088/0960-1317/14/5/010

Chicago

Lin Wang, Yohannes M. Desta, Joachim Schulz, Herbert Hein, Peter Jakobs, Rainer K. Fettig, and Jost Goettert. 2004. “High Resolution X-Ray Mask Fabrication by a 100 KeV Electron-Beam Lithography System.” Journal of Micromechanics and Microengineering 14 (March): 722–26. doi:10.1088/0960-1317/14/5/010.