Development of MoSi 2 coating on Nb-1Zr-0.1C alloy

MoSi 2 coating has been developed on Nb-1Zr-0.1C alloy surface by firstly depositing Mo using magnetron sputtering technique and subsequent Si deposition by a chemical vapor deposition process namely pack siliconizing. About 2 μm thick interdiffusion zone is formed after annealing the Mo-coated Nb-alloy at 1500°C. The detailed characterization studies using XRF, SEM, EDS and EBSD of the pack siliconized coated alloy revealed the formation of an outer MoSi 2 layer and an inner NbSi 2 layer. About 25 μm thick MoSi 2 layer comprising of fine grained microstructure is formed at 1100°C.