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Improvement of photo-functional properties of TiO2thin film coated by W surface layer
- Source :
- Electronics and Communications in Japan. 96:45-52
- Publication Year :
- 2013
- Publisher :
- Wiley, 2013.
-
Abstract
- TiO2 thin films with a W layer to improve photo-functional properties were prepared using the reactive magnetron sputtering method. The W thin films at a thickness of 0.4 to 2.5 mm were coated onto the TiO2 thin films using the same magnetron sputtering. The surface chemical state of the W-coated TiO2 thin films measured by X-ray photoelectron spectroscopy showed W metal and/or W oxide on the TiO2 thin film. A spectrophotometer was used to investigate UV-Vis absorption of the W-coated TiO2 thin films which absorb energy of longer wavelength than the TiO2 thin film without the W surface layer. Visible-light photocatalysis of the W-coated TiO2 thin films was improved by four points in the sample with a W layer thickness of 1.7 nm, and photoconductivity was improved by four times under an artificial sun lamp. It is demonstrated that these improvements in the photo-functional properties were achieved by a different cause. © 2013 Wiley Periodicals, Inc. Electron Comm Jpn, 96(3): 45–52, 2013; Published online in Wiley Online Library (wileyonlinelibrary.com). DOI 10.1002/ecj.11409
- Subjects :
- Materials science
Computer Networks and Communications
business.industry
Applied Mathematics
Layer by layer
General Physics and Astronomy
Sputter deposition
Carbon film
X-ray photoelectron spectroscopy
Sputtering
Signal Processing
Optoelectronics
Surface layer
Electrical and Electronic Engineering
Thin film
business
Layer (electronics)
Subjects
Details
- ISSN :
- 19429533
- Volume :
- 96
- Database :
- OpenAIRE
- Journal :
- Electronics and Communications in Japan
- Accession number :
- edsair.doi...........15b0ae30b001621f706f311de94dc521