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Dose-dependent milling efficiencies of helium and nitrogen beams in PMMA

Authors :
Munenori Uno
Gunter Ellrott
Hiroshi Mizuta
Vojislav Krstić
Maria Koleśnik-Gray
Shinichi Ogawa
Yukinori Morita
Muruganathan Manoharan
Source :
Microelectronic Engineering. 249:111621
Publication Year :
2021
Publisher :
Elsevier BV, 2021.

Abstract

Focused ion beams with varied exposure dose were used to mill rectangular trenches into PMMA on SiO2. The dose response was investigated by atomic force microscopy measurements. TRIM calculations were used to simulate the ion distributions and damages expected inside the target. The depth of the trenches measured by AFM showed an unexpected decrease for intermediate dosages of high energetic helium ions in contrast to low energetic helium and nitrogen ions. This has been attributed to the formation of metastable blisters in the PMMA layer.

Details

ISSN :
01679317
Volume :
249
Database :
OpenAIRE
Journal :
Microelectronic Engineering
Accession number :
edsair.doi...........15853652834b59e152a1ccc658b68a13
Full Text :
https://doi.org/10.1016/j.mee.2021.111621