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Dose-dependent milling efficiencies of helium and nitrogen beams in PMMA
- Source :
- Microelectronic Engineering. 249:111621
- Publication Year :
- 2021
- Publisher :
- Elsevier BV, 2021.
-
Abstract
- Focused ion beams with varied exposure dose were used to mill rectangular trenches into PMMA on SiO2. The dose response was investigated by atomic force microscopy measurements. TRIM calculations were used to simulate the ion distributions and damages expected inside the target. The depth of the trenches measured by AFM showed an unexpected decrease for intermediate dosages of high energetic helium ions in contrast to low energetic helium and nitrogen ions. This has been attributed to the formation of metastable blisters in the PMMA layer.
- Subjects :
- Materials science
Atomic force microscopy
Physics::Medical Physics
technology, industry, and agriculture
Analytical chemistry
Dose dependence
chemistry.chemical_element
Blisters
Condensed Matter Physics
Nitrogen
Atomic and Molecular Physics, and Optics
Computer Science::Other
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Ion
chemistry
Metastability
medicine
Electrical and Electronic Engineering
medicine.symptom
Layer (electronics)
Helium
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 249
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........15853652834b59e152a1ccc658b68a13
- Full Text :
- https://doi.org/10.1016/j.mee.2021.111621