Selected performance parameters and functional principles of a new stepper generation

Modern wafer stepper generations are capable of realizinghigher circiut levels due to high-performance lenses in the WV region, but at the same time there is also the • necessity of designing assembly groups of the wafer stepper so that they meetthe requirements of a wide assortment range in modem device fabrication. Long years of practical experience in the use of steppers enabled Jenoptik to implement an new generation of wafer steppers, in whichparticular value was placed on the instrumental improvement of theparamemters:. interna] thermostatting/mininnim particle contamination— alignment accuracy - useful depth of focus. . I . INTRODUCTION Jenoptik JENA GmbEI looks back to a nearly 20-year-experience in the denel opment and producti on of photol ithography eiivs. During thisperiod about 500 photorepeaters and 230 wafer steppers were produced and on the basis of intergcrvernmentil agreements, mainly suppliedto the Comecon countries . Main trading partner of photol ithography