Photochemistry of acyloxymethyl(benzyl)silanes. Evidence for the primary formation of a benzyl-silyl radical pair and mechanism of free-radical 1,2-(carbon .fwdarw. silicon)-acyloxy migration

MLA

Hideki Sakurai, et al. “Photochemistry of Acyloxymethyl(Benzyl)Silanes. Evidence for the Primary Formation of a Benzyl-Silyl Radical Pair and Mechanism of Free-Radical 1,2-(Carbon .Fwdarw. Silicon)-Acyloxy Migration.” Journal of the American Chemical Society, vol. 107, Dec. 1985, pp. 7767–68. EBSCOhost, https://doi.org/10.1021/ja00311a093.

APA

Hideki Sakurai, Mitsuo Kira, & Hitoaki Yoshida. (1985). Photochemistry of acyloxymethyl(benzyl)silanes. Evidence for the primary formation of a benzyl-silyl radical pair and mechanism of free-radical 1,2-(carbon .fwdarw. silicon)-acyloxy migration. Journal of the American Chemical Society, 107, 7767–7768. https://doi.org/10.1021/ja00311a093

Chicago

Hideki Sakurai, Mitsuo Kira, and Hitoaki Yoshida. 1985. “Photochemistry of Acyloxymethyl(Benzyl)Silanes. Evidence for the Primary Formation of a Benzyl-Silyl Radical Pair and Mechanism of Free-Radical 1,2-(Carbon .Fwdarw. Silicon)-Acyloxy Migration.” Journal of the American Chemical Society 107 (December): 7767–68. doi:10.1021/ja00311a093.