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Laser formation of Pt-Si Schottky barriers on silicon
- Source :
- Journal of Electronic Materials. 9:453-458
- Publication Year :
- 1980
- Publisher :
- Springer Science and Business Media LLC, 1980.
-
Abstract
- 135 nsec pulses ofλ = 1.06μm light from a Nd: YAG laser have been used to form Schottky barriers by irradiation of a 500A thick metal film on n-type silicon. Large area barriers were fabricated by over-lapping individual 30μ diameter laser pulses of from 4 to 12 J/cm2. The barrier height was 0.73 ± 0.03 V, independent of the laser power. The barrier quality, as assessed by measurement of the forward current characteristic, decreased with laser power to a value of n = 1.5 at 12 J/cm2.
- Subjects :
- Materials science
Silicon
Solid-state physics
business.industry
Schottky barrier
Schottky diode
chemistry.chemical_element
Condensed Matter Physics
Laser
Electronic, Optical and Magnetic Materials
law.invention
chemistry
law
Materials Chemistry
Optoelectronics
Laser power scaling
Irradiation
Electrical and Electronic Engineering
business
Forward current
Subjects
Details
- ISSN :
- 1543186X and 03615235
- Volume :
- 9
- Database :
- OpenAIRE
- Journal :
- Journal of Electronic Materials
- Accession number :
- edsair.doi...........1467a377558abe959edffa8a08642936
- Full Text :
- https://doi.org/10.1007/bf02670861